Low-pressure Chemical Vapour Deposition of Silicon Nanoparticles:Synthesis and Characterisation

Low Pressure Chemical Vapour Deposition at Quasi- High Flow

A new chemical vapour deposition (CVD) technique is presented. It is especially advantageous for the deposition of compound materials. The technique improves the uniformity and reproducibility of the deposition. The economical use of gaseous reactants is improved by a factor varying between 5 and 20. This is important in the case of expensive metal-organic CVD methods. The method consists in th...

Microscopic characterisation of suspended graphene grown by chemical vapour deposition.

We present a multi-technique characterisation of graphene grown by chemical vapour deposition (CVD) and thereafter transferred to and suspended on a grid for transmission electron microscopy (TEM). The properties of the electronic band structure are investigated by angle-resolved photoelectron spectromicroscopy, while the structural and crystalline properties are studied by TEM and Raman spectr...

Pressure and temperature dependence of silicon doping of GaAs using Si2H6 in metalorganic chemical vapour deposition

Laser-Induced Chemical Vapour Deposition of Silicon Carbonitride

Laser-induced Chemical Vapour Deposition of silicon carbonitride coatings and powders has been investigated using hexamethyldisilazane (HMDS) and ammonia as reactants. An industrial CW CO2-laser in parallel configuration has been used to heat up the reactant gases. HMDS dissociates in the laser beam and reactive radicals are formed which increase rapidly in molecular weight by an addition mecha...

Remote plasma chemical vapour deposition of silicon nitride films

The relatively new technique of remote plasma enhanced